发明名称 |
SPUTTERING TARGET AND TRANSPARENT CONDUCTIVE FILM |
摘要 |
A sputtering target containing a hexagonal laminar compound formed of indium oxide and zinc oxide and represented by In<SUB>2</SUB>O<SUB>3</SUB>(ZnO)<SUB>m </SUB>wherein m is an integer of 2 to 7 and further contains 0.01 to 1 at % of an oxide of a third element having a normal valence of 4 or more, and a transparent electrically conductive film formed therefrom. The sputtering target has a low volume resistivity and permits stable sputtering. The transparent electrically conductive film is excellent in etchability. |
申请公布号 |
KR20140069373(A) |
申请公布日期 |
2014.06.09 |
申请号 |
KR20147013473 |
申请日期 |
2002.05.24 |
申请人 |
IDEMITSU KOSAN CO., LTD. |
发明人 |
INOUE KAZUYOSHI;MATSUZAKI SHIGEO |
分类号 |
C23F1/16;C23C14/08;C23C14/34;C23C14/54 |
主分类号 |
C23F1/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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