| 摘要 |
The present invention is an etchant composition used for etching multi-layered metal film. The multi-layered metal film comprises: at least one layer of copper or alloy of copper; and at least one layer of molybdenum or alloy of molybdenum. The etchant composition comprises: 50-80 wt% of phosphoric acid; 0.5-10 wt% of nitric acid; 4-30 wt% of acetic acid; 0.5-6 wt% of chorine-containing compound; and the rest amount of water. And a method for etching multi-layered metal film, using the same, is provided. |
