发明名称 GAS AND MOISTURE PERMEATION BARRIERS
摘要 A gas and moisture permeation barrier stack deposited by both sputtering and atomic layer deposition techniques. In one embodiment, the barrier stack comprises a bottom barrier layer deposited on a substrate by sputtering and a top barrier layer deposited on the sputtered layer by atomic layer deposition. In one embodiment, the sputtered barrier layer has a water vapor transmission rate of about 10−5 gm/m2·day or lower, and the top barrier layer improves the water vapor transmission rate of the resulting two-layer barrier stack to about 10−6 gm/m2·day or lower.
申请公布号 US2014151656(A1) 申请公布日期 2014.06.05
申请号 US201314073809 申请日期 2013.11.06
申请人 CHEIL INDUSTRIES, INC. 发明人 Zeng Xianghui;Moro Lorenza;Boesch Damien
分类号 H01L51/52 主分类号 H01L51/52
代理机构 代理人
主权项 1. A composite article comprising: a substrate; and a barrier stack for protecting a surface of the substrate, the barrier stack comprising: a first barrier layer on the surface of the substrate, the first barrier layer being a sputtered barrier layer, anda second barrier layer on a surface of the first barrier layer, the second barrier layer being an atomic layer-deposited barrier layer, the first barrier layer being between the substrate and the second barrier layer, wherein the first barrier layer, in the absence of the second barrier layer, has a water vapor transmission rate of about 10−5 gm/m2·day or lower, and wherein the barrier stack has a water vapor transmission rate of about 10−6 gm/m2·day or lower.
地址 Uiwang-si KR