发明名称 PROTECTION FOR THE EPITAXIAL STRUCTURE OF METAL DEVICES
摘要 Techniques for fabricating metal devices, such as vertical light-emitting diode (VLED) devices, power devices, laser diodes, and vertical cavity surface emitting laser devices, are provided. Devices produced accordingly may benefit from greater yields and enhanced performance over conventional metal devices, such as higher brightness of the light-emitting diode and increased thermal conductivity. Moreover, the invention discloses techniques in the fabrication arts that are applicable to GaN-based electronic devices in cases where there is a high heat dissipation rate of the metal devices that have an original non-(or low) thermally conductive and/or non-(or low) electrically conductive carrier substrate that has been removed.
申请公布号 US2014151630(A1) 申请公布日期 2014.06.05
申请号 US201213693199 申请日期 2012.12.04
申请人 Fan Feng-Hsu;Doan Trung Tri;Tran Chuong Anh;Chu Chen-Fu;Cheng Chao-Chen;Chu Jiunn-Yi;Liu Wen-Huang;Cheng Hao-Chun;Yen Jui-Kang 发明人 Fan Feng-Hsu;Doan Trung Tri;Tran Chuong Anh;Chu Chen-Fu;Cheng Chao-Chen;Chu Jiunn-Yi;Liu Wen-Huang;Cheng Hao-Chun;Yen Jui-Kang
分类号 H01L33/04 主分类号 H01L33/04
代理机构 代理人
主权项 1. A semiconductor die comprising: a metal substrate; an epitaxial structure disposed above the metal substrate, comprising: a p-doped layer coupled to the metal substrate; andan n-doped layer disposed above the p-doped layer; an electrically non-conductive material substantially covering lateral surfaces of the epitaxial structure; and an insulative layer disposed between the lateral surfaces of the epitaxial structure and the electrically non-conductive material.
地址 Jhonghe City TW