发明名称
摘要 To provide a hard gold-based plating solution which enables selective partial plating treatment and is suitable for electronic components such as a connector. A hard gold-based plating solution of the present invention comprises: a soluble gold salt or a gold complex; a conductive salt; and a chelating agent, wherein the hard gold-based plating solution further comprises an aromatic compound having one or more nitro groups, for example, an aromatic compound selected from the group consisting of nitrobenzoic acid, dinitrobenzoic acid and nitrobenzene sulfonic acid. The hard gold-based plating solution further comprises at least one metal salt of a cobalt salt, a nickel salt and a silver salt, or polyethyleneimine as an organic additive.
申请公布号 JP5513784(B2) 申请公布日期 2014.06.04
申请号 JP20090147253 申请日期 2009.06.22
申请人 发明人
分类号 C25D3/48;C25D3/62 主分类号 C25D3/48
代理机构 代理人
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