发明名称 DROPLET GENERATOR, EUV RADIATION SOURCE, LITHOGRAPHIC APPARATUS, METHOD FOR GENERATING DROPLETS AND DEVICE MANUFACTURING METHOD.
摘要 <p>A droplet generator, for an EUV radiation source, comprises: a capillary in which, in use, molten material flows; an actuator configured to modulate a pressure inside the capillary; and a controller configured to drive the actuator at a driving frequency; wherein the droplet generator is arranged such that, in use, the driving frequency is equal or about equal to a main resonance frequency of the molten material in the capillary.</p>
申请公布号 NL2011741(A) 申请公布日期 2014.06.04
申请号 NL20132011741 申请日期 2013.11.06
申请人 ASML NETHERLANDS B.V. 发明人 DIJKSMAN JOHAN;BADIE RAMIN;HULTERMANS RONALD;LABETSKI DZMITRY
分类号 G03F7/20;H05G2/00 主分类号 G03F7/20
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