| 摘要 |
The present invention relates to a pressure sub-chamber and a deposition apparatus comprising the same. The pressure sub-chamber of the present invention comprises: a sub-chamber main body installed to communicate with an upper part of a crucible; a shutter which opens/closes an upper opening of the sub-chamber main body; a driving means for opening or closing the shutter; and a partition portion for forming a moving path of a evaporation material ejected from the crucible inside of the sub-chamber main body. By obtaining the moving path and a space for a material evaporated within the crucible while the shutter is closed, increase in pressure in the crucible can be prevented. |
