Methods and apparatuses for roll-on coating

摘要

Methods and apparatuses for a deposition system are provided to deposit a thin coating layer on flat substrates, such as semiconductors or panels. In an embodiment, liquid supplied rollers accepting liquid media provide liquid chemicals to the substrates for coating the substrates. The liquid delivery system can control the flow and the pressure of the liquid to achieve optimum process condition with minimum excess waste. In another embodiment, rollers with non-uniform distribution of liquid media provide a non-uniform thickness profile on the substrates, which can be used to compensate for the non-uniformity of subsequent processes.

主权项

1. A deposition system for depositing a coating on a substrate, comprising:
a plurality of rotatable fluid-supplied rollers, wherein the rollers are configured to deliver a fluid coating on the substrate, wherein the coating is non-uniform in thickness in a direction along a length of the rollers, wherein the thickness non-uniformity delivered by the rollers is configured to compensate for a non-uniform subsequent process so that after the non-uniform subsequent process, a uniform substrate is achieved from the combination of the non-uniform coating and the non-uniform subsequent process, each roller comprising
an elongated rod comprising a coupler for accepting a fluid at an end of the rod, the elongated rod configured to transfer the fluid from the end of the rod to a portion of the elongated outer surface of the rod;a porous layer covering a portion of the elongated outer surface of the rod, wherein the porous layer receives the fluid at the outer surface of the rod; a fixed fluid delivery line coupled to the coupler for delivering fluid to the rollers, wherein the coupler comprises a rotatable element for enabling coupling the rotating roller to the fixed fluid delivery line; and a rotating mechanism for rotating the fluid-supplied rollers.