发明名称 Oxide based memory with a controlled oxygen vacancy conduction path
摘要 Methods, devices, and systems associated with oxide based memory can include a method of forming an oxide based memory cell. Forming an oxide based memory cell can include forming a first conductive element, forming a substoichiometric oxide over the first conductive element, forming a second conductive element over the substoichiometric oxide, and oxidizing edges of the substoichiometric oxide by subjecting the substoichiometric oxide to an oxidizing environment to define a controlled oxygen vacancy conduction path near a center of the oxide.
申请公布号 US8742386(B2) 申请公布日期 2014.06.03
申请号 US201313903307 申请日期 2013.05.28
申请人 Micron Technology, Inc. 发明人 Liu Jun;Sandhu Gurtej S.
分类号 H01L29/04 主分类号 H01L29/04
代理机构 代理人
主权项 1. An oxide based memory cell, comprising: a first conductive element; a substoichiometric oxide on the first conductive element; and a second conductive element directly on the substoichiometric oxide; wherein the memory cell includes a controlled oxygen vacancy conduction path near a center of the substoichiometric oxide.
地址 Boise ID US