发明名称 METHOD FOR MANUFACTURING VAPOR DEPOSITION MASK
摘要 PROBLEM TO BE SOLVED: To improve the accuracy of positions where a plurality of opening patterns are formed.SOLUTION: A method for manufacturing a composite type vapor deposition mask where a resin film 17 formed with opening patterns 16, having the same geometry as that of thin film patterns, corresponding to the thin film patterns deposited on a substrate and a thin plate-shaped magnetic metal member 15 formed with through holes 14 having a size involving the opening pattern 16 are brought into close contact with each other, comprises steps of: forming a member 7 for a mask having a structure where the magnetic metal member 15 formed with the through holes 14 and the resin film 17 before being formed with the opening patterns 16 are brought into close contact with each other; forming marks 23 having a constant shape and depth by irradiating laser light L to the film 17 in the through holes 14 of the member 7 for a mask; and forming the opening patterns 16 penetrating the film 17 by irradiating the laser light L to predetermined positions on the basis of the marks 23.
申请公布号 JP2014098196(A) 申请公布日期 2014.05.29
申请号 JP20120250974 申请日期 2012.11.15
申请人 V TECHNOLOGY CO LTD 发明人 MIZUMURA MICHINOBU
分类号 C23C14/04 主分类号 C23C14/04
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