| 摘要 |
PROBLEM TO BE SOLVED: To provide an image processing apparatus that achieves image processing suitable for addressing on a sample generated by patterning using a directed self-assembly (DSA) technology, a pattern generation method using a directed self-assembly lithography technology, and a computer program.SOLUTION: There are provided an image processing apparatus that creates a template for addressing on the basis of guide pattern data used for patterning using DSA, a pattern generation method using a directed self-assembly lithography technology, and a computer program, to measure a pattern formed through a patterning process using DSA, or to create an addressing pattern suitable for alignment of field of view when inspection is performed. |
