发明名称 VAPOR DEPOSITION APPARATUS OF ORGANIC MATERIAL
摘要 PROBLEM TO BE SOLVED: To provide a vapor deposition apparatus of an organic material capable of performing vapor deposition in a stable composition without deteriorating purity of the organic material or the like, and further without decomposing the organic material.SOLUTION: A vapor deposition apparatus of an organic material is used for vapor-depositing the organic material on a film deposition object material in a vacuum atmosphere. The vapor deposition apparatus has an evaporation chamber in which the organic material is arranged, and which is used for heating and evaporating the organic material, and a guide part for guiding vapor of the organic material generated in the evaporation chamber to the film deposition object material. The evaporation chamber is always kept at a lower temperature than the guide part.
申请公布号 JP2014098207(A) 申请公布日期 2014.05.29
申请号 JP20130212187 申请日期 2013.10.09
申请人 FUJIFILM CORP 发明人 IMADA YUKI
分类号 C23C14/24;C23C14/12;H01L51/50;H05B33/10 主分类号 C23C14/24
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