发明名称 |
METHOD OF FABRICATING ZINC OXIDE THIN FILM |
摘要 |
A method of fabricating a zinc oxide (ZnO) thin film in which the surface shape of the ZnO thin film can be controlled during deposition of the ZnO thin film. The method includes depositing the ZnO thin film on a substrate by chemical vapor deposition (CVD). The CVD feeds an etching gas that etches the ZnO thin film concurrently with a source gas and an oxidizer gas, thereby controlling the surface shape of the ZnO thin film that is being deposited. |
申请公布号 |
US2014144770(A1) |
申请公布日期 |
2014.05.29 |
申请号 |
US201314089080 |
申请日期 |
2013.11.25 |
申请人 |
SAMSUNG CORNING PRECISION MATERIALS CO., LTD. |
发明人 |
YOON GUN SANG;KIM SEO HYUN;LEE HYUNHEE;YOO YOUNG ZO |
分类号 |
C23C14/00 |
主分类号 |
C23C14/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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