Coating a disk-shaped substrate, comprises arranging a disk-shaped substrate in substrate holder of carrier, and introducing the carrier with the substrate into a coating apparatus, where front side of substrate is coated by apparatus

摘要

The method comprises arranging a disk-shaped substrate (3) having a front side (31) and a rear side (32) in a substrate holder (12) of a substrate carrier (1), introducing the carrier with the substrate into a coating apparatus, where the front side is coated by the coating apparatus, and then discharging the carrier with the substrate from the coating apparatus, and covering the rear side by a substrate cover in a region of the coating apparatus. The cover is connected to the carrier before introducing the carrier so that the rear side of the substrate is covered. The method comprises arranging a disk-shaped substrate (3) having a front side (31) and a rear side (32) in a substrate holder (12) of a substrate carrier (1), introducing the substrate carrier with the substrate into a coating apparatus, where the front side is coated by the coating apparatus, and then discharging the substrate carrier with the substrate from the coating apparatus, and covering the rear side by a substrate cover in a region of the coating apparatus. The substrate cover is connected to the substrate carrier before introducing the substrate carrier so that the rear side of the substrate is covered, and the cover with the substrate carrier is introduced into the coating apparatus. The cover is arranged in a coating line, and is released and removed from the substrate carrier after passing through the coating apparatus. The cover in the region of the coating apparatus is interconnected with a circulating endless belt segment. The speed of cover in the region of the coating apparatus is equal to the speed of the substrate carrier. The temperature of the cover is measured and evaluated for process control. A space between the cover and the substrate is provided for heat transfer gas. The heat transfer gas from a gas-releasing coating of the cover is discharged into the space. An emission coefficient of the cover is measured for monitoring the function status of the cover. Independent claims are included for: (1) an apparatus for substrate handling; and (2) a coating apparatus for disk-shaped substrate.