LOADING PORT, SYSTEM FOR ETCHING AND CLEANING WAFERS AND METHOD OF USE

摘要

Disclosed are a system having a loading port and a method for using the system. The loading port comprises a housing and multiple stations arranged on the housing for receiving a front opening universal pod (FOUP). Also, the loading port comprises a connector for receiving inert gas. At least one among the multiple stations transfers the inert gas to the FOUP to purge the internal space of the FOUP containing moisture.