| 摘要 |
The invention relates to a raw gas generating device which inhibits the concentration reduction of raw gas. Solid raw material (102) in a container (111) is heated in the raw gas generating device (101), and raw gas for CVD (Chemical Vapor Deposition) processing is generated. Carrier gas led to the container (111) through a breather pipe (113) is diffused through a diffuser (131) of a gas diffusion member (115), and is ejected vertically downward from an opening part (115A). The raw gas generated by the solid raw material (102) together with the carrier gas is ejected outside the container (111) from above the solid raw material (102) through a breather pipe (116). The invention provides a raw gas generating device suitable for generating raw gas for CVD processing. |
