| 摘要 |
PROBLEM TO BE SOLVED: To provide an optical imaging device, especially for microlithography, including an imaging unit for imaging an object point at an image point and a measuring device.SOLUTION: An imaging unit includes a first optical element group having a plurality of first optical elements configured to be involved in the imaging of an object point at an image point. A measuring device is configured to determine the imaging error occurring when imaging an object point at an image point, and includes a measuring light source, a second optical element group, and a detection unit. The measuring light source emits a plurality of measuring light beams. The second optical element group includes a plurality of second optical elements configured to deflect the measuring light beam to the detection unit so that the second optical element group generates a detection signal. The second optical elements have a spatial relation defined for the first optical elements. The measuring device is configured to determine the imaging error by using the detection signal. A first optical surface and a second optical surface are arranged in mutual correspondence so that the measuring light beam is reflected a plurality of times between these optical surfaces. |
