发明名称 GaN-BASED SCHOTTKY DIODE HAVING DUAL METAL, PARTIALLY RECESSED ELECTRODE
摘要 A semiconductor device includes a substrate, a first active layer disposed over the substrate and a second active layer disposed on the first active layer. The second active layer has a higher bandgap than the first active layer such that a two-dimensional electron gas layer arises between the first active layer and the second active layer. A first electrode has a first portion disposed in a recess in the second active layer and a second portion disposed on the second active layer such that a Schottky junction is formed therewith. The first portion of the first electrode has a lower Schottky potential barrier than the second portion of the first electrode. A second electrode is in contact with the first active layer. The second electrode establishes an ohmic junction with the first active layer
申请公布号 US2014138698(A1) 申请公布日期 2014.05.22
申请号 US201213678572 申请日期 2012.11.16
申请人 VISHAY GENERAL SEMICONDUCTOR LLC 发明人 LIN YIH-YIN
分类号 H01L29/872;H01L29/20;H01L29/66 主分类号 H01L29/872
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