发明名称 Reflecting device, communicating pipe, exhausting pump, exhaust system, method for cleaning the system, storage medium storing program for implementing the method, substrate processing apparatus, and particle capturing component
摘要 A reflecting device that enables to prevent infiltration of particles into a processing chamber. The reflecting device is disposed in a communicating pipe. The communicating pipe allows the processing chamber of a substrate processing apparatus and an exhaust pump to communicate with each other. The exhaust pump has at least one rotary blade. The reflecting device comprises at least one reflecting surface. The at least one reflecting surface is oriented to the exhausting pump.
申请公布号 US8727708(B2) 申请公布日期 2014.05.20
申请号 US201113047370 申请日期 2011.03.14
申请人 MORIYA TSUYOSHI;MURAKAMI TAKAHIRO;KOBAYASHI YOSHIYUKI;SATO TETSUJI;SUGAWARA EIICHI;ENDOH SHOSUKE;FUJIMORI MASAKI;TOKYO ELECTRON LIMITED 发明人 MORIYA TSUYOSHI;MURAKAMI TAKAHIRO;KOBAYASHI YOSHIYUKI;SATO TETSUJI;SUGAWARA EIICHI;ENDOH SHOSUKE;FUJIMORI MASAKI
分类号 F04D29/70;F04D19/04 主分类号 F04D29/70
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