发明名称 |
Ultra high-speed wet etching apparatus |
摘要 |
There is provided with an etching method using an etching apparatus. Four arms can be positioned in a direction substantially from a center of the stage toward a peripheral portion with an angle difference of about 90°. Etchant is supplied to a first position nearest to the center of the object which is rotating, from a first etchant supply nozzle placed on a first arm. Etchant is further supplied to a second position second nearest to the center of the object, from a second etchant supply nozzle placed on a second arm. The second arm is substantially symmetrically positioned with respect to the first arm and the second arm has an angle difference of about 180° with respect to the first arm. |
申请公布号 |
US8728338(B2) |
申请公布日期 |
2014.05.20 |
申请号 |
US201313887730 |
申请日期 |
2013.05.06 |
申请人 |
NATIONAL UNIVERSITY CORPORATION OF TOHOKU UNIVERSITY;NATIONAL UNIVERSITY CORPORATION TOHOKU UNIVERSITY |
发明人 |
OHMI TADAHIRO;OHASHI TOMOTSUGU;YOSHIKAWA KAZUHIRO;YOSHIDA TETSURO;UCHIMURA TEPPEI;SOEDA KAZUKI |
分类号 |
B44C1/22;C03C15/00;C03C25/68;C23F1/00 |
主分类号 |
B44C1/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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