发明名称 Chemical bath deposition apparatus for fabrication of semiconductor films through roll-to-roll processes
摘要 A chemical bath deposition apparatus is presented to prepare different thin films on continuous flexible substrates in roll-to-roll processes. In particular, they are useful to deposit CdS or ZnS buffer layers in manufacture of thin film solar cells. This apparatus deposits thin films onto vertically travelling continuous flexible workpieces delivered by a roll-to-roll system. The thin films are deposited with continuously spraying the reaction solutions from their freshly mixed styles to gradually aged forms until the designed thickness is obtained. The substrates and the solutions are heated to a reaction temperature. During the deposition processes, the front surfaces of the flexible substrates are totally covered with the sprayed solutions but the substrate backsides are remained dry. The reaction ambience inside the reactor can be isolated from the outside atmosphere. The apparatus is designed to generate a minimum amount of waste solutions for chemical treatments.
申请公布号 US8726829(B2) 申请公布日期 2014.05.20
申请号 US201113154481 申请日期 2011.06.07
申请人 WANG JIAXIONG 发明人 WANG JIAXIONG
分类号 C23C16/00 主分类号 C23C16/00
代理机构 代理人
主权项
地址