| 摘要 |
A method for forming an optical filter is disclosed. According to the above forming method, an outer black matrix surrounding a panel area is formed on a substrate including the panel area, a peripheral area and an alignment area, and a dummy black matrix exposing the alignment area by being located in the peripheral area is formed. A first color photo resist film covering the outer black matrix and the dummy black matrix is formed on the substrate. A first color pattern is formed in the panel area, by patterning the first color photo resist film, and an alignment pattern is formed in the alignment area. A second photo resist film covering the outer black matrix, the dummy black matrix, the first color pattern and the alignment pattern is formed on the substrate. A second color pattern is formed in the panel area, by patterning the second color photo resist film. A third color pattern is formed in the panel area. |
