| 摘要 |
Disclosed are a deposition apparatus and a deposition method. The deposition apparatus comprises a generator to produce an intermediate compound by using a source material, a storage part to collect and store the intermediate compound, and a reaction part in which the intermediate compound is introduced and reaction of the intermediate compound occurs. The deposition method comprises producing an intermediate compound by using a source material, collecting and storing the intermediate compound, and introducing the intermediate compound into a reaction furnace and allowing the intermediate compound to react to a substrate or a wafer. |
