发明名称 OVERLAY MARK AND MEASUREMENT METHOD THEREOF
摘要 An overlay mark including at least one first overlay mark and at least one second overlay mark is provided. The first overlay mark includes a plurality of first bars and a plurality of first spaces arranged alternately, and the first spaces are not constant. The second overlay mark includes a plurality of second bars and a plurality of second spaces arranged alternately, and the second spaces are constant. Besides, the second overlay mark partially overlaps with the first overlay mark.
申请公布号 US2014132283(A1) 申请公布日期 2014.05.15
申请号 US201213674704 申请日期 2012.11.12
申请人 UNITED MICROELECTRONICS CORP. 发明人 HUANG KUO-CHUN;CHEN CHIEN-HAO;HUANG WEN-LIANG
分类号 G01R27/26;G01R27/02 主分类号 G01R27/26
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