发明名称 METHOD FOR ELECTROLESS PLATING AND SOLUTION USED FOR THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a pretreatment method for selective metallization of the surface of a non-conductive material and a solution used in the method and containing a catalytic metal ion, an acid containing a sulfonate group and chloride ion.SOLUTION: A method for selective metallization includes (a) a step of modifying chemically or physically the surface in a to-be-plated region to prepare the surface of a non-conductive material, (b) a step of bringing the non-conductive material into contact with a pretreatment solution containing a conditioning agent and alkaline substance, (c) a step of bringing the non-conductive material into contact with a catalyst solution containing a catalytic metal ion, an acid having at least one sulfonate group and chloride ion and (d) a step of electroless plating of the to-be-plated region of the surface of the non-conductive material. The conditioning agent is selected from anionic surfactants and organic acids, and the catalyst solution contains 1-50 ppm of a catalytic metal ion, based on the weight of the solution.
申请公布号 JP2014088618(A) 申请公布日期 2014.05.15
申请号 JP20130221919 申请日期 2013.10.25
申请人 ROHM & HAAS ELECTRONIC MATERIALS LLC 发明人 DENNIS KWOK-WAI YEE;MICHAEL CHI-YUNG TANG;BAYES MARTIN W;KA-MING YIP;CHAN CHUN-MAN;CHAN HUNG-TAT;LI TSUI-KIU;LOK-LOK LIU
分类号 C23C18/20 主分类号 C23C18/20
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