SUBSTRATE PROCESSING APPARATUS

摘要

Disclosed is a substrate processing apparatus capable of easily replacing and maintaining a sensor for measuring thickness of a thin film being deposited during a deposition process. The substrate processing apparatus disclosed comprises: a transport unit which moves a sensor for measuring thickness of a thin film being deposited by a deposition apparatus to the outside through a side wall of a deposition chamber; and a door installed to be able to open/close on one side wall of the deposition chamber. Thus, a sensor for measuring a quantity of evaporation can be replaced and maintained easily without any safety accident since the sensor can be moved to the outside through one side of the deposition chamber.