发明名称 |
VACUUM FILM FORMATION DEVICE |
摘要 |
Provided is a vacuum coating apparatus that deposits a coating on a substrate, the vacuum coating apparatus including: a vacuum chamber; a vacuum exhaust unit that performs a vacuum exhaust operation inside the vacuum chamber; a plurality of rotation holding units that hold the substrate as a coating subject in a rotating state; and a revolution mechanism that revolves the plurality of rotation holding units about a revolution axis parallel to the rotation axes of the respective rotation holding units; in which the plurality of rotation holding units are divided into a plurality of groups so that power is supplied to the respective rotation holding units in a manner that the rotation holding units of the respective groups have different potentials. For example, the respective groups alternately repeat a state where the rotation holding units become cathodes and serve as working electrodes that play primary role to generate glow discharge plasma and a state where the rotation holding units serve as counter electrodes. |
申请公布号 |
EP2730677(A1) |
申请公布日期 |
2014.05.14 |
申请号 |
EP20120806892 |
申请日期 |
2012.07.05 |
申请人 |
KABUSHIKI KAISHA KOBE SEIKO SHO |
发明人 |
TAMAGAKI, HIROSHI;HAGA, JUNJI |
分类号 |
C23C16/458;C23C14/32;C23C14/34;C23C14/50;C23C16/509;C23C16/515;H01J37/32;H01L21/67;H01L21/687 |
主分类号 |
C23C16/458 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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