| 摘要 |
PURPOSE: A substrate processing device is provided to prevent a processing liquid used for a corresponding process of substrate from flowing into an area on which the other process is performed. CONSTITUTION: A first in-shower spray nozzle(210) sprays a first processing liquid on a substrate. The substrate is located in a first area of a chamber. A second in-shower spray nozzle(220) sprays a second processing liquid on the substrate. The substrate is located in a second area near the first area of the chamber. A removing liquid nozzle(230) is arranged in between the first in-shower nozzle and the second in-shower nozzle. The removing liquid nozzle sprays the air in between the first in-shower nozzle and the second in-shower nozzle. |
