WAFER LEVEL VACUUM SEALING METHOD USING CONFORMAL DEPOSITION
摘要
Disclosed is a wafer level vacuum sealing method using conformal deposition. The disclosed wafer level vacuum sealing method includes a step of preparing read circuit wafers on which arrays comprising detection devices are arranged; a step of preparing a capping wafer for packing the detection device array in vacuum on the read circuit wafer; a step of bonding the capping wafer on the read circuit wafer; and a step of sealing a via hole which is formed in the capping wafer with a via material by conformal deposition.
申请公布号
KR20140058016(A)
申请公布日期
2014.05.14
申请号
KR20120124466
申请日期
2012.11.05
申请人
SAMSUNG ELECTRONICS CO., LTD.
发明人
PARK, HAE SEOK;HONG, HYUN GUE;NAM, SUNG HYUN;ROH, SOOK YOUNG;YUN, SEOK HO