发明名称 WAFER LEVEL VACUUM SEALING METHOD USING CONFORMAL DEPOSITION
摘要 Disclosed is a wafer level vacuum sealing method using conformal deposition. The disclosed wafer level vacuum sealing method includes a step of preparing read circuit wafers on which arrays comprising detection devices are arranged; a step of preparing a capping wafer for packing the detection device array in vacuum on the read circuit wafer; a step of bonding the capping wafer on the read circuit wafer; and a step of sealing a via hole which is formed in the capping wafer with a via material by conformal deposition.
申请公布号 KR20140058016(A) 申请公布日期 2014.05.14
申请号 KR20120124466 申请日期 2012.11.05
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 PARK, HAE SEOK;HONG, HYUN GUE;NAM, SUNG HYUN;ROH, SOOK YOUNG;YUN, SEOK HO
分类号 H01L21/56;H01L23/28 主分类号 H01L21/56
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