发明名称 Method of making a floating gate non-volatile MOS semiconductor memory device with improved capacitive coupling and device thus obtained
摘要 A method of making a non-volatile MOS semiconductor memory device includes a formation phase, in a semiconductor material substrate, of isolation regions filled by field oxide and of memory cells separated each other by said isolation regions The memory cells include an electrically active region surmounted by a gate electrode electrically isolated from the semiconductor material substrate by a first dielectric layer; the gate electrode includes a floating gate defined. simultaneously to the active electrically region. A formation phase of said floating gate exhibiting a substantially saddle shape including a concavity is proposed.
申请公布号 US8722490(B2) 申请公布日期 2014.05.13
申请号 US201113219491 申请日期 2011.08.26
申请人 SERVALLI GIORGIO;BRAZZELLI DANIELA;MICRON TECHNOLOGY, INC. 发明人 SERVALLI GIORGIO;BRAZZELLI DANIELA
分类号 H01L21/336;H01L29/788 主分类号 H01L21/336
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