发明名称 SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To efficiently transfer heat from a device in a semiconductor device including the device surrounded by a resin material to inhibit metal diffusion into a crystal.SOLUTION: A semiconductor device manufacturing method comprises: arranging a metal layer on a rear face of a first semiconductor device opposite to a principal surface via a barrier layer; curing the first semiconductor device and a second semiconductor device of a type different from the first semiconductor device by covering the first semiconductor device and the second semiconductor device with a resin layer from the rear face side of the first semiconductor device; thinning the resin layer to expose the metal layer of the first semiconductor device and a part of the second semiconductor device; forming bump electrodes on the metal layer of the first semiconductor device and at the exposed part of the second semiconductor device; and joining the bump electrodes to a circuit board.
申请公布号 JP2014086660(A) 申请公布日期 2014.05.12
申请号 JP20120236539 申请日期 2012.10.26
申请人 FUJITSU LTD 发明人 KITADA HIDEKI
分类号 H01L23/373;G02B6/42 主分类号 H01L23/373
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