发明名称 MONITORING DEVICE, ILLUMINATION OPTICAL SYSTEM, EXPOSURE DEVICE, AND MANUFACTURING METHOD FOR DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To provide a monitoring device capable of monitoring the pupil intensity distribution, changing in various shapes by switching the illumination conditions, with high accuracy.SOLUTION: An monitoring device monitors the light intensity distribution formed on a specified surface in the optical path of an illumination optical system for illuminating an irradiated surface with the light from a light source. The monitoring device includes a beam splitter disposed closer to the light source side than the specified surface in the optical path and guiding a portion of the illumination light to a monitoring optical path, a photoelectric converter disposed at a position conjugate with the specified surface in the optical path, and a dimming member disposed removably for the optical path between the beam splitter and the photoelectric converter, and dimming the light directed toward the photoelectric converter.</p>
申请公布号 JP2014086474(A) 申请公布日期 2014.05.12
申请号 JP20120232469 申请日期 2012.10.22
申请人 NIKON CORP 发明人 KANAYAMATANI NOBUMICHI
分类号 H01L21/027 主分类号 H01L21/027
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