| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a film deposition device capable of improving a film quality by restraining re-evaporation of a film deposition material.SOLUTION: In a film deposition device, at least one part of a surface 22 of a main hearth 21 is covered with a cover member 30. Accordingly, one part of the diffused film deposition material is not adhered to the surface 22 of the main hearth 21, and is adhered to the cover member 30. Here, the cover member 30 is electrically insulated from the main hearth 21, and therefore, a current does not flow through the cover member 30. Thus, temperature of the cover member 30 is not increased up to temperature at which the film deposition material is re-evaporated, so as to restrain the film deposition material adhered to the cover member 30 from being mixed with a film formed on a surface of a film deposited material due to re-evaporation.</p> |
