发明名称 GAS BARRIER FILM AND METHOD FOR MANUFACTURING A GAS BARRIER FILM
摘要 PROBLEM TO BE SOLVED: To provide a gas barrier film capable of sufficiently inhibiting the attenuation of the gas barrier property thereof even when exposed to continuous vibrations over an extended period.SOLUTION: The provided gas barrier film is a gas barrier film possessing, on at least one surface of a substrate 1, a gas barrier layer 3 including silicon, oxygen, and carbon as constituent elements wherein, of distribution curves of the respective elements drawn based on element distribution measurements of the gas barrier layer along the depth direction thereof by the X-ray photoelectron spectroscopic method (XPS), a carbon distribution curve expressing the relation of the distance, from the surface of the gas barrier layer, along the thickness direction of the gas barrier layer and the ratio of the quantity of carbon atoms with respect to the combined sum of silicon, oxygen, and carbon atoms (carbon atom ratio) has at least two maximal values of mutually different magnitudes and wherein multiple sets of these maximal values appear non-periodically on the carbon distribution curve in correspondence to the variation of the distance from the surface of the gas barrier layer.
申请公布号 JP2014083691(A) 申请公布日期 2014.05.12
申请号 JP20120231773 申请日期 2012.10.19
申请人 KONICA MINOLTA INC 发明人 TAKAMUKAI YASUHIKO
分类号 B32B9/00;C23C16/42 主分类号 B32B9/00
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