遮罩基底、制造曝光遮罩的方法、制造反射式遮罩基底的方法及制造压印模板的方法,申请号TW097106579-传众专利搜索

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发明名称	遮罩基底、制造曝光遮罩的方法、制造反射式遮罩基底的方法及制造压印模板的方法
摘要
申请公布号	TWI437362	申请公布日期	2014.05.11
申请号	TW097106579	申请日期	2008.02.26
申请人	ＨＯＹＡ股份有限公司日本	发明人	野泽顺;暮石光浩
分类号	G03F1/88;H01L21/027	主分类号	G03F1/88
代理机构		代理人	洪澄文台北市南港区三重路19之6号2楼
主权项
地址	日本

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