发明名称 METROLOGY METHOD AND APPARATUS, AND DEVICE MANUFACTURING METHOD
摘要 <p>A target structure including a periodic structure is formed on a substrate. An image of the target structure is detected while illuminating the target structure with a beam of radiation, the image being formed using a first part of non-zero order diffracted radiation while excluding zero order diffracted radiation. Intensity values extracted from a region of interest within the image are used to determine a property of the periodic structure. A processing unit recognizes locations of a plurality of boundary features in the image of the target structure to identify regions of interest. The number of boundary features in each direction is at least twice a number of boundaries of periodic structures within the target structure. The accuracy of locating the region is greater than by recognizing only the boundaries of the periodic structure(s).</p>
申请公布号 KR20140056336(A) 申请公布日期 2014.05.09
申请号 KR20147006585 申请日期 2012.06.28
申请人 ASML NETHERLANDS B.V. 发明人 WARNAAR PATRICK;VAN SCHIJNDEL MARK;KUBIS MICHAEL
分类号 G03F7/20;H01L21/027 主分类号 G03F7/20
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