| 摘要 |
[Problem] To prevent high-temperature plasma material adhered to an electrode from splattering into a chamber interior, even when the rotations of a rotating disc-shaped discharge electrode are at a high speed. [Solution] Discharge electrodes (2a, 2b) are partially immersed in a container (15), and rotation of the electrodes (2a, 2b) causes high-temperature plasma material (14) adhered to the electrodes to be conveyed into a discharge space. EUV light is emitted by generating a pulse discharge between the electrodes (2a, 2b) in a state where the high-temperature plasma material (14) is vaporized. A plurality of capturing grooves (10a, 10b) for capturing the high-temperature plasma material are provided in a concentric circle near the peripheral edges of the discharge electrodes (2a, 2b). When the discharge electrodes (2a, 2b) rotate, the high-temperature plasma material (14) adhered to regions where plasma generation is unnecessary flows into the capturing grooves (10a, 10b). As a result, it is possible to suppress the scattering of a high-temperature plasma material into a chamber interior, without noticeably increasing the film thickness of the high-temperature plasma material in the peripheral-edge section of electrodes. |
