| 摘要 |
A recovery method for recovering an exposure apparatus that exposes a pattern image onto a substrate in a case that certain processing has not normally ended is provided that includes the steps of registering a plurality of processing methods to the processing in advance; determining whether or not the processing has normally ended each time the processing is performed; associating and storing the number of times the processing has been performed and the number of times the processing has normally ended with the processing method employed when the processing has been performed, as history information; and selecting the processing method to be next employed from the plurality of processing methods based on the history information in a case that the processing has not normally ended. |
