发明名称 METAL OXIDE FILM AND METHOD FOR FORMING METAL OXIDE FILM
摘要 A metal oxide film including a crystal part and having highly stable physical properties is provided. The size of the crystal part is less than or equal to 10 nm, which allows the observation of circumferentially arranged spots in a nanobeam electron diffraction pattern of the cross section of the metal oxide film when the measurement area is greater than or equal to 5 nmφand less than or equal to 10 nmφ.
申请公布号 US2014124776(A1) 申请公布日期 2014.05.08
申请号 US201314071932 申请日期 2013.11.05
申请人 SEMICONDUCTORS ENERGY LABORATORY CO., LTD. 发明人 TAKAHASHI MASAHIRO;HIROHASHI TAKUYA;TSUBUKU MASASHI;ISHIHARA NORITAKA;OOTA MASASHI
分类号 H01L29/04;G01N23/207;H01L21/66;H01L29/22;H01L29/24 主分类号 H01L29/04
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