| 摘要 |
The present invention relates to a vacuum deposition apparatus equipped with a trim shield, capable of adjusting a deposition rate when vaporizing one or more types of evaporation materials and depositing the same on a substrate. The vacuum deposition apparatus equipped with a width-adjustable trim shield comprises a vacuum chamber in which an evaporation material is supplied from an evaporation source to deposit the evaporation material on a substrate, a body installed in the vacuum chamber and allowing a wing to be fixed thereto, a plurality of wings installed on the body to prevent deposition material from being deposited in an overlapping manner, and a wing fixing device for fixing the wings to the body. According to the present invention, uniformity of thin films can be enhanced, the onerousness of making a trim shield for every deposition process can be eliminated, and time and costs required for making a trim shield each time can be significantly reduced by preventing a plurality of evaporation materials from being deposited on a substrate in an overlapping manner, by being equipped with the trim shield, on which wings of different length can be detachably attached to the body to be replaced. |
