Illumination device for projection exposure system i.e. EUV projection exposure system, has light source passing light to field mirror and pupil mirror, and field mirror formed in different positions and light regions of pupil mirror

摘要

The device has a light source i.e. X-ray laser or idle electron laser (1), passing light to a field mirror (2) and a pupil mirror (3). A reticle (4) illuminates according to reflectance from the pupil mirror. The field mirror is formed in different positions and reflected light different regions of the pupil mirror. The field mirror and the pupil mirror are facet mirror. Mirror facets are arranged at an outer surface around a wheel axle. A support is provided in the field mirror and adjusts a layer of the field mirror. A diffuser is arranged between the light source and the field mirror. An independent claim is also included for a method for lighting of a reticle in an illumination device.