发明名称 |
Field facet mirror for an illumination optics of a projection exposure apparatus for EUV microlithography |
摘要 |
A field facet mirror for an illumination optics of a projection exposure apparatus for EUV microlithography transmits a structure of an object arranged in an object field into an image field. The field facet mirror has a plurality of field facets with reflection surfaces. The arrangement of the field facets next to one another spans a base plane. Projections of the reflection surfaces of at least two of the field facets onto the base plane differ with respect to at least one of the following parameters: size, shape, orientation. A field facet mirror results which can ensure a uniform object field illumination with a simultaneously high EUV throughput. |
申请公布号 |
US8717541(B2) |
申请公布日期 |
2014.05.06 |
申请号 |
US201113034275 |
申请日期 |
2011.02.24 |
申请人 |
STAICU ADRIAN;ENDRES MARTIN;CARL ZEISS SMT GMBH |
发明人 |
STAICU ADRIAN;ENDRES MARTIN |
分类号 |
G03B27/54;G03B27/42 |
主分类号 |
G03B27/54 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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