发明名称 Metal-insulator-metal capacitors
摘要 Metal-insulator-metal capacitors are provided that are formed in integrated circuit dielectric stacks. A line-plate-line capacitor is provided that alternates layers that contain metal plates with layers that contain straight or angled parallel lines of alternating polarity. A segmented-plate capacitor is provided that has metal plates that alternate in polarity both within a layer and between layers. The line-plate-line and segmented-plate capacitors may exhibit a reduced parasitic inductive coupling. The capacitances of the line-plate-line capacitor and the metal-insulator-metal capacitor may have an enhanced contribution from an interlayer capacitance component with a vertical electric field than a horizontal intralayer capacitance component with a horizontal electric field.
申请公布号 US8716778(B2) 申请公布日期 2014.05.06
申请号 US20080272671 申请日期 2008.11.17
申请人 CHEN SHUXIAN;WATT JEFFREY T.;CHIAN MOJY CURTIS;ALTERA CORPORATION 发明人 CHEN SHUXIAN;WATT JEFFREY T.;CHIAN MOJY CURTIS
分类号 H01L27/108;H01L29/76;H01L29/94;H01L31/119 主分类号 H01L27/108
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