发明名称 |
Metal-insulator-metal capacitors |
摘要 |
Metal-insulator-metal capacitors are provided that are formed in integrated circuit dielectric stacks. A line-plate-line capacitor is provided that alternates layers that contain metal plates with layers that contain straight or angled parallel lines of alternating polarity. A segmented-plate capacitor is provided that has metal plates that alternate in polarity both within a layer and between layers. The line-plate-line and segmented-plate capacitors may exhibit a reduced parasitic inductive coupling. The capacitances of the line-plate-line capacitor and the metal-insulator-metal capacitor may have an enhanced contribution from an interlayer capacitance component with a vertical electric field than a horizontal intralayer capacitance component with a horizontal electric field. |
申请公布号 |
US8716778(B2) |
申请公布日期 |
2014.05.06 |
申请号 |
US20080272671 |
申请日期 |
2008.11.17 |
申请人 |
CHEN SHUXIAN;WATT JEFFREY T.;CHIAN MOJY CURTIS;ALTERA CORPORATION |
发明人 |
CHEN SHUXIAN;WATT JEFFREY T.;CHIAN MOJY CURTIS |
分类号 |
H01L27/108;H01L29/76;H01L29/94;H01L31/119 |
主分类号 |
H01L27/108 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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