发明名称 PATTERNING DEVICE MANIPULATING SYSTEM AND LITHOGRAPHIC APPARATUSES
摘要 <p>A system (300) for supporting an exchangeable object (302) can include a movable structure (304) and an object holder (306) configured to be movable relative to the movable structure. The object holder can be configured to hold the exchangeable object. The system can also include a first actuator assembly (308) and second actuator assembly (316). The first actuator assembly can be configured to apply a force to the object holder to translate the exchangeable object generally along a plane. The second actuator assembly can be configured to apply a bending moment to the object holder. The exchangeable object can be a patterning device of a lithographic apparatus.</p>
申请公布号 WO2014063871(A1) 申请公布日期 2014.05.01
申请号 WO2013EP69547 申请日期 2013.09.20
申请人 ASML NETHERLANDS B.V.;ASML HOLDING N.V. 发明人 VALENTIN, CHRISTIAAN;LOOPSTRA, ERIK;WARD, CHRISTOPHER;BURBANK, DANIEL;SCHUSTER, MARK;GRAFFEO, PETER
分类号 G03F7/20 主分类号 G03F7/20
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