| 摘要 |
PROBLEM TO BE SOLVED: To provide an organocopper complex capable of forming a copper oxide thin film by annealing treatment at low temperatures.SOLUTION: Provided are an organocopper complex having a structure represented by general formula (1), and a copper oxide thin film comprising the organocopper complex, wherein R, R, R, and Reach represent an alkyl group or the like, R, and Reach represent a hydrogen atom, an alkyl group, or the like, and when all of R, R, R, and Rrepresent a methyl group, Rand Reach represent an alkyl group or the like. |
