发明名称 |
APPARATUS AND METHOD FOR REMOVING DEFECT |
摘要 |
An apparatus for removing a defect according to the embodiment includes an image processing part for observing a surface of a substrate; a layer forming part for forming a layer on the surface of the substrate; and a humidity controlling part for controlling humidity in a chamber in which the substrate is placed. A method for removing a defect according to the embodiment includes detecting the defect on a surface of a substrate; forming an oxide layer by oxidizing the defect; and removing the oxide layer. A method for removing a defect according to another embodiment includes forming an oxide layer on an entire surface of a substrate; and removing the oxide layer to remove the defect. |
申请公布号 |
US2014120638(A1) |
申请公布日期 |
2014.05.01 |
申请号 |
US201214128372 |
申请日期 |
2012.06.13 |
申请人 |
KIM MOO SEONG;HWANG MIN YOUNG;LG INNOTEK CO., LTD. |
发明人 |
KIM MOO SEONG;HWANG MIN YOUNG |
分类号 |
H01L21/66 |
主分类号 |
H01L21/66 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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