| 摘要 |
A method for fabricating a display device is provided to detect a scratch defect of a substrate made of stainless steel and other metals, thereby exactly laminating a next layer without align error. A first conductive layer is formed on a substrate(101) in which a plurality of defects exists. The first conductive layer is selectively patterned so that a gate electrode and an align key(107) are formed. A gate insulating layer and a semiconductor layer are formed on the substrate having the gate electrode and align key. The second conductive layer is formed on the substrate having the semiconductor layer. The second conductive layer is patterned selectively through a photomask aligning process so that source/drain electrodes and a dumpy pattern overlapped with the align key are simultaneously formed. |
