| 发明名称 |
PROCESS FOR DEPOSITING SULFUR FILMS AND PARTICLES WITH ANTIMICROBIAL ACTIVITY OVER ORGANIC AND INORGANIC SUBSTRATES BY COLD PLASMA. |
| 摘要 |
The present invention refers to the deposit of sulfur films and particles over organic and inorganic substrates through the use of radiofrequency cold plasma for promoting the antimicrobial properties of the treated materials. The treatment conditions and the gas optionally containing sulfur are intended to control the chemical composition, the morphology, and the size of the particles which dimensions range from the nanometers to micrometers. The deposited particles of sulfur have a high microbial activity which may be compared to other systems of inorganic nanoparticles, but with the particularity of being harmless to human cells. |
| 申请公布号 |
MX2012012722(A) |
申请公布日期 |
2014.04.30 |
| 申请号 |
MX20120012722 |
申请日期 |
2012.10.31 |
| 申请人 |
CENTRO DE INVESTIGACION EN QUIMICA APLICADA |
发明人 |
CARLOS ALBERTO AVILA ORTA;MARIA GUADALUPE NEIRA VELAZQUEZ;PABLO GONZALEZ MORONES;BEATRIZ LILIANA ESPAÑA SANCHEZ;YIBRAN ARGENIS PERERA MERCADO;ERNESTO HERNANDEZ HERNANDEZ;CLAUDIA HERNANDEZ RAMOS;ANTELMO RODOLFO YASSER RUIZ MARTINEZ;MARCELA AIDE ZAMARRON PONCE |
| 分类号 |
A01N59/02 |
主分类号 |
A01N59/02 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
