发明名称 |
Vertical heat treatment apparatus |
摘要 |
A vertical heat treatment apparatus enabling the insertion of a temperature sensor in the reaction tube without disassembling the apparatus is disclosed. The vertical heat treatment apparatus includes a reaction tube; a heating section; a wafer holding section; a supporting section movably provided in the vertical direction so as to seal the reaction tube while the wafer holding section is in the reaction tube; a temperature sensor insertion section provided in the supporting section and having a through hole for guiding a temperature sensor so that the temperature sensor can be inserted into the reaction tube; and a cap section for opening and closing the through hole of the temperature sensor insertion section while the wafer holding section is on the supporting section. |
申请公布号 |
US8709159(B2) |
申请公布日期 |
2014.04.29 |
申请号 |
US20080170477 |
申请日期 |
2008.07.10 |
申请人 |
OKAMURA NOBUYUKI;RICOH COMPANY, LTD. |
发明人 |
OKAMURA NOBUYUKI |
分类号 |
C23C16/00;C23F1/00;H01L21/306 |
主分类号 |
C23C16/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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