发明名称 |
Apparatus and method for manufacturing an integrated circuit |
摘要 |
An apparatus for manufacturing an integrated circuit having a thick film metal layer includes an applicator for applying a layer of metal paste onto a heat-conducting substrate. The metal paste includes metal particles of a predetermined size. An RF generator selectively inductively couples RF energy into the metal paste. The predetermined size of the metal particles of the metal paste corresponds to a coupling frequency of the RF energy for heating the metal particles. In this way, the metal particles of the metal paste are heated with only a small fraction of the power of conventional processes, and without the need to pre-sinter the metal paste. |
申请公布号 |
US8707896(B2) |
申请公布日期 |
2014.04.29 |
申请号 |
US201013258105 |
申请日期 |
2010.03.24 |
申请人 |
DE WIJS WILLEM-JAN A.;VAN DE SANDE MARCUS JOHANNES;KONINKLIJKE PHILIPS N.V. |
发明人 |
DE WIJS WILLEM-JAN A.;VAN DE SANDE MARCUS JOHANNES |
分类号 |
H01L21/28;B05C9/00;B05C9/08;B05C9/14;H01L21/00;H01L21/02;H05K3/10;H05K3/12 |
主分类号 |
H01L21/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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